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Iso- and Anisotropic Etching of Micro Nanofibrillated Cellulose Films by Sequential Oxygen and Nitrogen Gas Plasma Exposure for Tunable Wettability on Crystalline and Amorphous Regions
Title: | Iso- and Anisotropic Etching of Micro Nanofibrillated Cellulose Films by Sequential Oxygen and Nitrogen Gas Plasma Exposure for Tunable Wettability on Crystalline and Amorphous Regions | Authors: | Dimic-Misic, Katarina; Kostić, Mirjana ![]() ![]() ![]() ![]() ![]() ![]() ![]() ![]() |
Issue Date: | 2021 | Publication: | Materials | ISSN: | 1996-1944![]() ![]() |
Type: | Article | Collation: | vol. 14 br. 13 str. 3571-3571 | DOI: | 10.3390/ma14133571 | WoS-ID: | 000671161700001 | Scopus-ID: | 2-s2.0-85109169744 | PMID: | 34202327 | URI: | https://physrep.ff.bg.ac.rs/handle/123456789/487 http://TechnoRep.tmf.bg.ac.rs/handle/123456789/4844 https://enauka.gov.rs/handle/123456789/295650 |
M-category: | 21M21 |
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