Iso- and Anisotropic Etching of Micro Nanofibrillated Cellulose Films by Sequential Oxygen and Nitrogen Gas Plasma Exposure for Tunable Wettability on Crystalline and Amorphous Regions

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Title:	Iso- and Anisotropic Etching of Micro Nanofibrillated Cellulose Films by Sequential Oxygen and Nitrogen Gas Plasma Exposure for Tunable Wettability on Crystalline and Amorphous Regions
Authors:	Dimic-Misic, Katarina ; Kostić, Mirjana ; Obradovic, Bratislav ; Kuraica, Milorad ; Kramar, Ana ; Imani, Monireh; Gane, Patrick
Issue Date:	2021
Publication:	Materials
ISSN:	1996-1944 Materials Search Idenfier
Type:	Article
Collation:	vol. 14 br. 13 str. 3571-3571
DOI:	10.3390/ma14133571
WoS-ID:	000671161700001
Scopus-ID:	2-s2.0-85109169744
PMID:	34202327
URI:	https://physrep.ff.bg.ac.rs/handle/123456789/487 http://TechnoRep.tmf.bg.ac.rs/handle/123456789/4844 https://enauka.gov.rs/handle/123456789/295650 https://TechnoRep.tmf.bg.ac.rs/handle/123456789/4844
M-category:	21aM21a

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