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eNauka >  Results >  Iso- and Anisotropic Etching of Micro Nanofibrillated Cellulose Films by Sequential Oxygen and Nitrogen Gas Plasma Exposure for Tunable Wettability on Crystalline and Amorphous Regions
Title: Iso- and Anisotropic Etching of Micro Nanofibrillated Cellulose Films by Sequential Oxygen and Nitrogen Gas Plasma Exposure for Tunable Wettability on Crystalline and Amorphous Regions
Authors: Dimic-Misic, Katarina; Kostić, Mirjana  ; Obradovic, Bratislav  ; Kuraica, Milorad  ; Kramar, Ana  ; Imani, Monireh; Gane, Patrick
Issue Date: 2021
Publication: Materials
ISSN: 1996-1944 Materials Search Idenfier
Type: Article
Collation: vol. 14 br. 13 str. 3571-3571
DOI: 10.3390/ma14133571
WoS-ID: 000671161700001
Scopus-ID: 2-s2.0-85109169744
PMID: 34202327
URI: https://physrep.ff.bg.ac.rs/handle/123456789/487
http://TechnoRep.tmf.bg.ac.rs/handle/123456789/4844
https://enauka.gov.rs/handle/123456789/295650
M-category: 
21M21

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