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Browsing by Author C. Rossel
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| Issue Date | Title | Author(s) | Type | Мp-cat. |
|---|---|---|---|---|
| 2015 | Low Dit HfO2/Al2O3/In0.53Ga0.47As gate stack achieved with plasma-enhanced atomic layer deposition | V. Djara; M. Sousa; N. Đorđević; L. Czornomaz; V. Deshpande; C. Marchiori; E. Uccelli; C. Rossel; J. Fompeyrine | Naučni članak | 22M22 - Međunarodni časopis kategorije M22 |