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Radiation Tolerance and Charge Trapping Enhancement of ALD HfO2/Al2O3 Nanolaminated Dielectrics
| Title: | Radiation Tolerance and Charge Trapping Enhancement of ALD HfO2/Al2O3 Nanolaminated Dielectrics | Authors: | Spassov, Dencho; Paskaleva, Albena; Guziewicz, Elżbieta; Davidović, Vojkan   ; Stanković, Srboljub J. ; Đorić-Veljković, Snežana ; Ivanov, Tzvetan; Stanchev, Todor; Stojadinović, Ninoslav |
Issue Date: | 2021 | Publication: | Materials | ISSN: | 1996-1944 Materials Search Idenfier |
Publisher: | Basel : MDPI, 2008- | Type: | Article | Collation: | vol. 14 br. 4 str. 849-849 | DOI: | 10.3390/ma14040849 | WoS-ID: | 000624113600001 | Scopus-ID: | 2-s2.0-85100931834 | PMID: | 33578892 | URI: | https://enauka.gov.rs/handle/123456789/474585 https://vinar.vin.bg.ac.rs/handle/123456789/9089 |
Project: | Bulgarian National Scientific Fund [KP-06-H37/32] | M-category: | 21aM21a |
