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Identification of radicals responsible for DNA cleavage by photolysis of bis-oxime esters
| Title: | Identification of radicals responsible for DNA cleavage by photolysis of bis-oxime esters | Authors: | Hwu, J.R.; Tsay, Shwu-Chen; Hung, S.C.; Hsu, M.-H.; Ma, J.-Y.; Mitić, Vojislav V.; Lazović, Goran   ; Chou, S.-S.P. |
Issue Date: | 2021 | Publication: | Advanced Ceramics and Applications | Publisher: | De Gruyter | Type: | Book parts | Collation: | str. 101-108 | DOI: | 10.1515/9783110627992-008 | Scopus-ID: | 2-s2.0-85127706537 | URI: | https://enauka.gov.rs/handle/123456789/573626 https://machinery.mas.bg.ac.rs/handle/123456789/3630 |
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