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Impurity removal and overall rate constant during low pressure treatment of liquid silicon
| Title: | Impurity removal and overall rate constant during low pressure treatment of liquid silicon | Authors: | Mitrašinović, Aleksandar M.   ; D'Souza, Ryan; Utigard, Torstein A. |
Issue Date: | 2012 | Publication: | Journal of Materials Processing Technology | ISSN: | 0924-0136 Journal of Materials Processing Technology Search Idenfier |
Type: | Article | Collation: | vol. 212 br. 1 str. 78-82 | DOI: | 10.1016/j.jmatprotec.2011.08.006 | WoS-ID: | 000297893000011 | Scopus-ID: | 2-s2.0-80655149006 | URI: | https://enauka.gov.rs/handle/123456789/765115 | Metadata source: | (Preuzeto iz ORCID-a) Mitrasinovic, Alex | M-category: | 21aM21a |
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