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Characterisation of SiOx thin films deposited by remote high density atomic oxygen plasma source
| Naziv: | Characterisation of SiOx thin films deposited by remote high density atomic oxygen plasma source | Autori: | Stefanović, Ilija   ; Awakowicz, Peter; Porteanu, Horia-Eugen; Klute, Michael; Brinkmann, Ralf-Peter |
Godina: | 2025 | Publikacija: | 21. Fachtagung f¨ur Plasmatechnologie = 21. Plasma Technology Conference, September, 23 – 25, 2025, Kiel University, Faculty of Engineering | Izdavač: | Kiel : Kiel University Faculty of Engineering | Tip rezultata: | Konferencijski rad | Kolacija: | str. 50-50 | URI: | https://dais.sanu.ac.rs/123456789/18632 https://enauka.gov.rs/handle/123456789/1019623 |
Projekat: | Ministarstvo nauke, tehnološkog razvoja i inovacija Republike Srbije, institucionalno finansiranje - 200175 (Institut tehničkih nauka SANU, Beograd) DFG project 389090373 |
M-kategorija: | Mp kategorija će biti prikazana naknadno. |
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