Iso- and Anisotropic Etching of Micro Nanofibrillated Cellulose Films by Sequential Oxygen and Nitrogen Gas Plasma Exposure for Tunable Wettability on Crystalline and Amorphous Regions

Dimic-Misic, Katarina; Kostić, Mirjana; Obradovic, Bratislav; Kuraica, Milorad; Kramar, Ana; Imani, Monireh; Gane, Patrick

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eNauka > Rezultati > Iso- and Anisotropic Etching of Micro Nanofibrillated Cellulose Films by Sequential Oxygen and Nitrogen Gas Plasma Exposure for Tunable Wettability on Crystalline and Amorphous Regions

Naziv:	Iso- and Anisotropic Etching of Micro Nanofibrillated Cellulose Films by Sequential Oxygen and Nitrogen Gas Plasma Exposure for Tunable Wettability on Crystalline and Amorphous Regions
Autori:	Dimic-Misic, Katarina; Kostić, Mirjana ; Obradovic, Bratislav ; Kuraica, Milorad ; Kramar, Ana ; Imani, Monireh; Gane, Patrick
Godina:	2021
Publikacija:	Materials
ISSN:	1996-1944 Materials Pretraži identifikator
Tip rezultata:	Naučni članak
Kolacija:	vol. 14 br. 13 str. 3571-3571
DOI:	10.3390/ma14133571
WoS-ID:	000671161700001
Scopus-ID:	2-s2.0-85109169744
PMID:	34202327
URI:	https://physrep.ff.bg.ac.rs/handle/123456789/487 http://TechnoRep.tmf.bg.ac.rs/handle/123456789/4844 https://enauka.gov.rs/handle/123456789/295650
M-kategorija:	21M21 - Rad u vrhunskom međ. časopisu

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