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Application of the level set method in three-dimensional simulations of the etching profile evolution for producing nano-scale devices
| Title: | Application of the level set method in three-dimensional simulations of the etching profile evolution for producing nano-scale devices | Authors: | Rađenović, Branislav |
Issue Date: | 2011 | Publication: | Optoelectronics and Advanced Materials-Rapid Communications | ISSN: | 1842-6573 Optoelectronics and Advanced Materials-Rapid Communications Search Idenfier |
Publisher: | INOE Publishing House | Type: | Article | Collation: | vol. 4 br. 8 str. 1193-1195 | WoS-ID: | 000281734800032 | URI: | https://enauka.gov.rs/handle/123456789/363191 | URL: | https://oam-rc.inoe.ro/download.php?idu=1194 | Metadata source: | Migrirano iz RIS podataka | M-category: | 23M23 |
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