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Micro-Raman depth profiling of silicon amorphization induced by high-energy ion channeling implantation
| Title: | Micro-Raman depth profiling of silicon amorphization induced by high-energy ion channeling implantation | Authors: | Erich, Marko   ; Petrović, Srđan M. ; Kokkoris, Michael; Liarokapis, E.; Antonakos, A.; Telečki, Igor N. |
Issue Date: | 2013 | Publication: | Journal of Raman Spectroscopy | ISSN: | 0377-0486 Journal of Raman Spectroscopy Search Idenfier1097-4555 Journal of Raman Spectroscopy Search Idenfier |
Type: | Article | Collation: | vol. 44 br. 3 str. 496-500 | DOI: | 10.1002/jrs.4211 | WoS-ID: | 000316966900024 | Scopus-ID: | 2-s2.0-84875734797 | URI: | https://enauka.gov.rs/handle/123456789/444660 https://vinar.vin.bg.ac.rs/handle/123456789/5393 |
Project: | SPIRIT - Support of Public and Industrial Research using Ion Beam Technology (EU-227012) Fizika i hemija sa jonskim snopovima (RS-45006) |
M-category: | 21M21 |
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