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eNauka >  Rezultati >  Properties of latent interface-trap buildup in irradiated metal-oxide-semiconductor transistors determined by switched bias isothermal annealing experiments
Naziv: Properties of latent interface-trap buildup in irradiated metal-oxide-semiconductor transistors determined by switched bias isothermal annealing experiments
Autori: Jaksic, Aleksandar B; Pejovic, Momcilo M; Ristic, Goran S  
Godina: 2000
Publikacija: APPLIED PHYSICS LETTERS
ISSN: 0003-6951 Applied Physics Letters Pretraži identifikator
Tip rezultata: Naučni članak
Kolacija: vol. 77 br. 25 str. 4220-4222
DOI: 10.1063/1.1336159
WoS-ID: 000165824200047
Scopus-ID: 2-s2.0-0346930594
URI: https://enauka.gov.rs/handle/123456789/825449
Izvor metapodataka: (Preuzeto iz Nasi u WoS)
M-kategorija: 
21a+M21a+ - Vodeći međunarodni časopis kategorije M21a+

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