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eNauka >  Results >  RETRACTION: Optimization of plasma etch rate of deposited thin films by adaptive neuro fuzzy inference system
Title: RETRACTION: Optimization of plasma etch rate of deposited thin films by adaptive neuro fuzzy inference system
Authors: Petrovic, Nikola  
Issue Date: 2024
Publication: INTERNATIONAL JOURNAL OF ADVANCED MANUFACTURING TECHNOLOGY
ISSN: 0268-3768 International Journal of Advanced Manufacturing Technology Search Idenfier
Type: Article
Collation: vol. 134 br. 7-8 str. 3989-3989
DOI: 10.1007/s00170-024-14355-4
WoS-ID: 001311863300014
Scopus-ID: 2-s2.0-85203042516
URI: https://enauka.gov.rs/handle/123456789/934161
URL: https://link.springer.com/content/pdf/10.1007/s00170-024-14355-4.pdf
Metadata source: (Preuzeto iz Nasi u WoS)
M-category: 
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