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eNauka >  Results >  Mechanism of oxygen reduction via chemical affinity in NiO/SiO2 interfaces irradiated with keV energy hydrogen and helium ions for heterostructure fabrication
Title: Mechanism of oxygen reduction via chemical affinity in NiO/SiO2 interfaces irradiated with keV energy hydrogen and helium ions for heterostructure fabrication
Authors: Mery, Mario; Gonzalez, Fuentes Claudio; Stanković, Igor  ; Nunez, Jorge M; Valdes, Jorge E; Aguirre, Myriam H; Garcia, Carlos
Issue Date: 2025
Publication: NANOSCALE HORIZONS
ISSN: 2055-6756 Nanoscale Horizons Search Idenfier
Type: Article
DOI: 10.1039/d4nh00460d
WoS-ID: 001387339800001
Scopus-ID: 2-s2.0-85213834652
URI: https://enauka.gov.rs/handle/123456789/961670
Project: FONDECYT Postdoctorado 2021 ANID [3210785]
Progetto PNRR PRIN (PETRA) [2022T7ZSEK (CUP E53D23001860006)]
European Union [101007825]
ANID FONDEQUIP [EQM140161]
ANID FONDECYT/REGULAR [1201102, 1241918]
Institute of Physics Belgrade, through the grant of the Ministry of Science, Technological Development and Innovation of the Republic of Serbia
Metadata source: (Preuzeto iz Nasi u WoS)
M-category: 
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