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eNauka >  Rezultati >  Mechanism of oxygen reduction via chemical affinity in NiO/SiO2 interfaces irradiated with keV energy hydrogen and helium ions for heterostructure fabrication
Naziv: Mechanism of oxygen reduction via chemical affinity in NiO/SiO2 interfaces irradiated with keV energy hydrogen and helium ions for heterostructure fabrication
Autori: Mery, Mario; Gonzalez, Fuentes Claudio; Stanković, Igor  ; Nunez, Jorge M; Valdes, Jorge E; Aguirre, Myriam H; Garcia, Carlos
Godina: 2025
Publikacija: NANOSCALE HORIZONS
ISSN: 2055-6756 Nanoscale Horizons Pretraži identifikator
Tip rezultata: Naučni članak
DOI: 10.1039/d4nh00460d
WoS-ID: 001387339800001
Scopus-ID: 2-s2.0-85213834652
URI: https://enauka.gov.rs/handle/123456789/961670
Projekat: FONDECYT Postdoctorado 2021 ANID [3210785]
Progetto PNRR PRIN (PETRA) [2022T7ZSEK (CUP E53D23001860006)]
European Union [101007825]
ANID FONDEQUIP [EQM140161]
ANID FONDECYT/REGULAR [1201102, 1241918]
Institute of Physics Belgrade, through the grant of the Ministry of Science, Technological Development and Innovation of the Republic of Serbia
Izvor metapodataka: (Preuzeto iz Nasi u WoS)
M-kategorija: 
21M21 - Vodeći međunarodni časopis kategorije M21

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