Results

eNauka >  Results >  Influence of charging on SiO2 etching profile evolution etched by fluorocarbon Plasmas
Title: Influence of charging on SiO2 etching profile evolution etched by fluorocarbon Plasmas
Authors: Radjenovic, B.; Radmilovc-Radjenovic, M.  ; Petrovic, Z. Lj.  
Issue Date: 2007
Publication: Materials Science Forum
ISSN: 0255-5476 Materials Science Forum Search Idenfier
Type: Conference Paper
Collation: vol. 555 str. 53-58
DOI: 10.4028/www.scientific.net/MSF.555.53
WoS-ID: 000249653700008
URI: https://vinar.vin.bg.ac.rs/handle/123456789/6584
https://enauka.gov.rs/handle/123456789/200810
Project: Ministry of Science and Environmental Protection of the Republic of Serbia
M-category: 
Mp. category will be shown later

4
OpenCitations
4
WEB OF SCIENCETM
Altmetric
Dimensions
Unpaywall

Google ScholarTM

Items in eNauka are protected by copyright, with all rights reserved, unless otherwise indicated.