Boron redistribution during SOI wafers thermal oxidation

Results

Naziv:	Boron redistribution during SOI wafers thermal oxidation
Autori:	Đurić, Zoran G. ; Smiljanić, Milče ; Radulović, Katarina ; Lazić, Žarko
Godina:	2006
Publikacija:	25th International Conference on Microelectronics, MIEL 2006 - Proceedings
ISSN:	2159-1660 Pretraži identifikator
Izdavač:	Institute of Electrical and Electronics Engineers Inc.
Tip rezultata:	Konferencijski rad
Kolacija:	str. 333-336
DOI:	10.1109/ICMEL.2006.1650961
WoS-ID:	000238839700064
Scopus-ID:	2-s2.0-77956553625
URI:	https://cer.ihtm.bg.ac.rs/handle/123456789/245 https://enauka.gov.rs/handle/123456789/202449
Projekat:	TR6151 - Micro and Nanosystem Technologies, Structures and Sensors
M-kategorija:	Mp kategorija će biti prikazana naknadno.

4
SCOPUS^TM

1
WEB OF SCIENCE^TM

Altmetric

Dimensions

Unpaywall

Google Scholar^TM