Microscopic Properties of the SiO2/Si Interface Growth Based on Numerical Simulations

Stosic, Borko D.; da Silva, Jr., Eronides F.

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Naziv:	Microscopic Properties of the SiO2/Si Interface Growth Based on Numerical Simulations
Autori:	Stosic, Borko D.; da Silva, Jr., Eronides F.
Godina:	1997
Publikacija:	Brazilian Journal of Physics
ISSN:	0103-9733 Brazilian Journal of Physics Pretraži identifikator 1678-4448 Brazilian Journal of Physics Pretraži identifikator
Tip rezultata:	Naučni članak
Kolacija:	vol. 27 br. 2 str. 325-333
WoS-ID:	000208952700029
URI:	https://vinar.vin.bg.ac.rs/handle/123456789/2736 https://enauka.gov.rs/handle/123456789/243990
Projekat:	Conselho Nacional de Desenvolvimento Cientifico e Tecnologico (CNPq), Financiadora de Estudos e Projetos (FINEP)
M-kategorija:	Mp kategorija će biti prikazana naknadno.

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