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eNauka >  Results >  3D Etching profile evolution simulations: Time dependence analysis of the profile charging during SiO2 etching in plasma
Title: 3D Etching profile evolution simulations: Time dependence analysis of the profile charging during SiO2 etching in plasma
Authors: Radjenovic, Branislav  ; Radmilovic-Radjenovic, Marija  
Issue Date: 2007
Publication: Journal of Physics: Conference Series
ISSN: 1742-6588 Search Idenfier
Type: Conference Paper
Collation: vol. 86 str. 012017-012017
DOI: 10.1088/1742-6596/86/1/012017
WoS-ID: 000256282900017
Scopus-ID: 2-s2.0-36349033424
URI: https://enauka.gov.rs/handle/123456789/361474
https://vinar.vin.bg.ac.rs/handle/123456789/6757
Project: TESLA, Ministry of Science and Environmental Protection
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