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3D Etching profile evolution simulations: Time dependence analysis of the profile charging during SiO2 etching in plasma
Title: | 3D Etching profile evolution simulations: Time dependence analysis of the profile charging during SiO2 etching in plasma | Authors: | Radjenovic, Branislav ![]() ![]() ![]() ![]() |
Issue Date: | 2007 | Publication: | Journal of Physics: Conference Series | ISSN: | 1742-6588![]() ![]() |
Type: | Conference Paper | Collation: | vol. 86 str. 012017-012017 | DOI: | 10.1088/1742-6596/86/1/012017 | WoS-ID: | 000256282900017 | Scopus-ID: | 2-s2.0-36349033424 | URI: | https://enauka.gov.rs/handle/123456789/361474 https://vinar.vin.bg.ac.rs/handle/123456789/6757 |
Project: | TESLA, Ministry of Science and Environmental Protection | M-category: | Mp. category will be shown later |
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