3D Etching profile evolution simulations: Time dependence analysis of the profile charging during SiO2 etching in plasma

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Naziv:	3D Etching profile evolution simulations: Time dependence analysis of the profile charging during SiO2 etching in plasma
Autori:	Radjenovic, Branislav ; Radmilovic-Radjenovic, Marija
Godina:	2007
Publikacija:	Journal of Physics: Conference Series
ISSN:	1742-6588 Pretraži identifikator
Tip rezultata:	Konferencijski rad
Kolacija:	vol. 86 str. 012017-012017
DOI:	10.1088/1742-6596/86/1/012017
WoS-ID:	000256282900017
Scopus-ID:	2-s2.0-36349033424
URI:	https://enauka.gov.rs/handle/123456789/361474 https://vinar.vin.bg.ac.rs/handle/123456789/6757
Projekat:	TESLA, Ministry of Science and Environmental Protection
M-kategorija:	Mp kategorija će biti prikazana naknadno.

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