Impact of γ Radiation on Charge Trapping Properties of Nanolaminated HfO2/Al2O3 ALD Stacks

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Title:	Impact of γ Radiation on Charge Trapping Properties of Nanolaminated HfO2/Al2O3 ALD Stacks
Authors:	Spassov, Dentcho; Paskaleva, Albena; Davidović, Vojkan S. ; Đorić-Veljković, Snežana M. ; Stanković, Srboljub J. ; Stojadinović, Ninoslav D. ; Ivanov, Tzvetan E.; Stanchev, T.
Issue Date:	2019
Publication:	2019 IEEE 31st International Conference on Microelectronics (MIEL)
ISSN:	2159-1660 Search Idenfier
Publisher:	Nis, Serbia : IEEE
Type:	Conference Paper
ISBN:	978-1-7281-3419-2 Search Idenfier
Collation:	str. 59-62
DOI:	10.1109/MIEL.2019.8889600
WoS-ID:	000565455600008
Scopus-ID:	2-s2.0-85075337912
URI:	https://enauka.gov.rs/handle/123456789/452893 https://vinar.vin.bg.ac.rs/handle/123456789/8658 https://ieeexplore.ieee.org/abstract/document/8889600 https://ieeexplore.ieee.org/document/8889600/
URL:	https://ieeexplore.ieee.org/abstract/document/8889600
M-category:	Mp. category will be shown later

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