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MODELLING OF THE EFFECT OF RADICALS ON PLASMAS USED FOR ETCHING IN MICROELECTRONICS
| Title: | MODELLING OF THE EFFECT OF RADICALS ON PLASMAS USED FOR ETCHING IN MICROELECTRONICS | Authors: | Nikitović, Željka |
Issue Date: | 2012 | Publication: | The 3rd INTERNATIONAL CONFERENCE ON THE PHYSICS OF OPTICAL MATERIALS AND DEVICES ICOM 2012 | Publisher: | Vinča Institute of Nuclear Sciences, University of Belgrade (Serbia) and the Laboratoire de Chimie de la Matière Condensée de Paris (France). | Type: | Conference Paper | ISBN: | 978-86-7306-116-0 Search Idenfier |
Collation: | str. 252-252 | URI: | https://enauka.gov.rs/handle/123456789/553727 | Metadata source: | Migrirano iz RIS podataka | M-category: | Mp. category will be shown later |
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