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| Title: | Real-time plasma control in a dual-frequency, confined plasma etcher | Authors: | Milosavljević, Vladimir   ; Ellingboe, A. R.; Gaman, C.; Ringwood, J. V. |
Issue Date: | 2008 | Publication: | Journal of Applied Physics | ISSN: | 0021-8979 Journal of Applied Physics Search Idenfier |
Type: | Article | Collation: | vol. 103 br. 8 | DOI: | 10.1063/1.2903137 | WoS-ID: | 000255456200027 | Scopus-ID: | 2-s2.0-43049151474 | URI: | https://physrep.ff.bg.ac.rs/handle/123456789/599 https://enauka.gov.rs/handle/123456789/606650 |
M-category: | 21M21 |
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