Modeling of the effect of radicals on plasmas used for etching in  microelectronics

Nikitovic, Zeljka; Radjenovic, Radmilovic Marija; Stojanovic, Vladimir; Petrović, Zoran

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Title :	Modeling of the effect of radicals on plasmas used for etching in microelectronics
Authors:	Nikitovic, Zeljka ; Radjenovic, Radmilovic Marija ; Stojanovic, Vladimir; Petrović, Zoran
Issue Date:	2009
Publication:	XXIX INTERNATIONAL CONFERENCE ON PHENOMENA IN IONIZED GASES, Cancún, México 12-17 July, 2009 ed. J. de Urquijo PA5-4, pp.61
Type:	Conference Paper
URI:	https://enauka.gov.rs/handle/123456789/789269
URL:	https://research.tue.nl/en/activities/29th-international-conference-on-phenomena-in-ionized-gases-icpig
Metadata source:	(Preuzeto iz ORCID-a) Nikitovic, Zeljka
M-category:	Mp. category will be shown later

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