Results
Title: | Neutralization of ion beams for reduction of charging damage in plasma etching | Authors: | Stojkovic, Aleksandra M ![]() ![]() ![]() ![]() |
Issue Date: | 2005 | Publication: | CURRENT RESEARCH IN ADVANCED MATERIALS AND PROCESSES | ISSN: | 0255-5476![]() ![]() |
Type: | Article | Collation: | vol. 494 str. 297-302 | WoS-ID: | 000230985800049 | URI: | https://enauka.gov.rs/handle/123456789/825624 | Metadata source: | (Preuzeto iz Nasi u WoS) | M-category: | 22M22 |
![](/image/wos.png)
WEB OF SCIENCETM
Items in eNauka are protected by copyright, with all rights reserved, unless otherwise indicated.