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Numerical simulation of creation-passivation kinetics of interface traps in irradiated n-channel power VDMOSFETs during thermal annealing with various gate biases
| Title: | Numerical simulation of creation-passivation kinetics of interface traps in irradiated n-channel power VDMOSFETs during thermal annealing with various gate biases | Authors: | Ristić, Goran |
Issue Date: | 1998 | Publication: | Microelectronic Engineering | ISSN: | 0167-9317 Microelectronic Engineering Search Idenfier |
Type: | Article | Collation: | vol. 40 br. 2 str. 51-60 | DOI: | 10.1016/s0167-9317(97)00193-7 | WoS-ID: | 000075115300001 | Scopus-ID: | 2-s2.0-0032115057 | URI: | https://enauka.gov.rs/handle/123456789/881627 | Metadata source: | (Preuzeto iz ORCID-a) Ristić, Goran | M-category: | 21M21 |
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