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Characterization of the Electric Breakdowns in Metal-Insulator-Silicon Capacitor Structures with HfO2/Al2O3 Layers for Non-Volatile Memory Applications
| Title: | Characterization of the Electric Breakdowns in Metal-Insulator-Silicon Capacitor Structures with HfO2/Al2O3 Layers for Non-Volatile Memory Applications | Authors: | Spassov, Dentcho; Paskaleva, Albena; Guziewicz, Elzbieta; Ivanov, Tz.; Stanchev, T.; Davidović, Vojkan   ; Veljković, Sandra ; Mitrović, Nikola ; Danković, Danijel |
Issue Date: | 2023 | Publication: | 2023 IEEE 33rd International Conference on Microelectronics (MIEL) | Type: | Conference Paper | ISBN: | 979-8-3503-4776-0  Search Idenfier |
Collation: | str. 1-4 | DOI: | 10.1109/MIEL58498.2023.10315813 | WoS-ID: | 001701718400010 | Scopus-ID: | 2-s2.0-85183081707 | URI: | https://enauka.gov.rs/handle/123456789/889208 | Metadata source: | (Preuzeto iz CrossRef-a) Danković, Danijel | M-category: | Mp. category will be shown later |
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